Course - Wuhan, China
Training course covers basic theory and physical operation. Students will study the constitution and working principle of the electron beam lithography system, and learn layout design, sample preparation, and practical operation of the instrument.
1. EBL Training Schedule
EBL Model: Vistec EBPG 5000 Plus
Date : 9:00-12:00; 14:00-17:00, 6/13/2015
Location: Optoelectronic Micronanoelectronic Manufacturing Process Platform, District E, WNLO, HUST
Training Contents:
9:00-10:00 Basic theory and operation of EBL
10:00-11:00 Layout design and processing
11:00-12:00, 14:00-17:00 sample preparation and hands on practice
EBL Model: Vistec EBPG 5000 Plus
Date : 9:00-12:00; 14:00-17:00, 6/13/2015
Location: Optoelectronic Micronanoelectronic Manufacturing Process Platform, District E, WNLO, HUST
Training Contents:
9:00-10:00 Basic theory and operation of EBL
10:00-11:00 Layout design and processing
11:00-12:00, 14:00-17:00 sample preparation and hands on practice
- Organization: Wuhan National Laboratory for Optoelectronics (WNLO)
Sat, Jun 13, 2015 - Sat, Jun 13, 2015
Huazhong University of Science and Technology
1037 Luoyu Road, Wuhan 430074, China
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