SPIE Advanced Lithography Exhibition 2014
Exhibition - San Jose, United States
The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for more than 35 years.
See the latest technology in advanced lithography:
+ Etch Technology for nanopatterning
+ Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET
+ Metrology, inspection, OPC, and process control
+ Design and manufacturing software
+ Materials and chemicals
+ Imaging equipment
+ Lasers
+ Resist materials and processing
+ Nano-imprint
+ IC and chip fabrication
+ Nanoscale imaging
Organization: SPIE - The international society for optics and photonics
(Courtesy of SPIE Advanced Lithography Exhibition 2014, via biztradeshows.com)
SPIE Advanced Lithography Exhibition 2014
Tuesday 25 February 2014 | 10:00 am to 5:00 pm
Wednesday 26 February 2014 | 10:00 am to 4:00 pm
San Jose Convention Center and San Jose Marriott
San Jose, United States
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