Science Researcher Update

SPIE Photomask Technology Exhibition 2013

Written by BCI Staff | Sep 3, 2013 10:54:00 AM

SPIE Photomask Technology Exhibition 2013

Exhibition - Monterey, CA, United States

It is more important than ever that you reach as many of your customers as possible. As the most recognized international meeting for presenting innovations in the mask-making industry, SPIE Photomask Technology is the event for the people, institutions, and companies driving this critical and influential business. See the latest in:

+ Electron-Beam Lithography + EUV + Metrology + Lasers + Optical/Laser Microlithography + Resist Technology and Processing + Software + Electronic Imaging Components

AUDIENCE
+ Engineers and Designers
+ Corporate Managers From The Mask Making Industry
+ Application and Product Developers
+ Mask and Chip Designers
+ Resist Chemists
+ Quality Assurance Specialists
+ Experts in Mask Infrastructure and Mask Integration
+ People Working in Emerging Mask Technologies

Organization: SPIE - The International Society for Optics and Photonics

(Courtesy of Monterey Conference Center, CA, via eventseye.com)

SPIE Photomask Technology Exhibition 2013

Tue, Sep 10, 2013 - Wed, Sep 11, 2013 (10:00 am to 4:30 pm; 6:30 pm to 8:00 pm)

Monterey Conference Center

1 Portola Plaza, Monterey, CA 93940, United States

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